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Rotatable SiAl Alloy Target：
Application:Make for SiO2film,Si3N4 film,mainly used in optical glass AR film,Low-e glass coating film,Semiconductor electronics,Planner Display,Tough screen glass and etc.
Chemical Form:SiAl
Element:SiAl(90:10wt%+-2%)
Process:Spraying
Density:≧2.2g/cm3(≧94%)
Purity:≧99.9%
Max impurity content:(ppm,Total impurity content≦1000ppm)
|
Fe |
≦350 |
Cu |
≦40 |
Ca |
≦60 |
|
Ga |
≦25 |
Zn |
≦70 |
Ti |
≦20 |
|
Ni |
≦30 |
N |
≦300 |
O |
≦6000 |
Max Processed Size:
Length 4000M
Thickness 6-15MM
Straight Type,Dog bone Type(As customer's requirement)
SiAl (Silicon & Aluminum ) Rotary Sputtering Target
1.Detail:
|
Content |
Si: 90 wt% ,Al:10 wt% |
|
Purity |
≥99.95% |
|
Relative Density |
≥96% |
|
Resistivity |
≤10mΩ·cm |
|
Specification |
length(max)4000mm*thickness(max)13mm; linearity:05.mm |
|
Processing Mode |
Plasma spraying |
|
Application |
Low emission glass |
|
Delivery time |
2 weeks after receipt of deposit |
2.Why Us :
|
High purity |
99.9% |
|
Uniform composition |
element Deviation Index ±2wt% |
|
Smaller grain |
<100μm |
|
High density |
2.251g/cm |
|
Low resitivity |
7 mΩ·cm |
